发明名称 |
COMPOSITIONS AND METHODS FOR CHEMICAL-MECHANICAL POLISHING OF PHASE CHANGE MATERIALS |
摘要 |
The present invention provides a chemical-mechanical polishing (CMP) composition suitable for polishing a substrate comprising a phase change material (PCM), such as a germanium-antimony-tellurium (GST) alloy. The composition comprises a particulate abrasive material in combination with lysine, an optional oxidizing agent, and an aqueous carrier therefor. CMP methods for polishing a phase change material-containing substrate utilizing the composition are also disclosed. |
申请公布号 |
EP2183333(A2) |
申请公布日期 |
2010.05.12 |
申请号 |
EP20080794699 |
申请日期 |
2008.07.24 |
申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
CHEN, ZHAN;LUO, KAI;VACASSY, ROBERT |
分类号 |
C09K3/14;B24B37/00;C09G1/02;G11C13/00;H01L21/302 |
主分类号 |
C09K3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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