| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method of photomask blank capable of stably manufacturing a photomask blank, which can prevent the warping due to a change of film stress before and after manufacturing the photomask blank by depositing a chromium based material film and before and after forming a film pattern by working the chromium based material film because the chromium based material film having extremely low film stress by sputtering when the chromium based material film is deposited on a substrate and permits high-precision exposure. Ž<P>SOLUTION: In the manufacturing method of photomask blank, the photomask blank is made by depositing the chromium based material film on a transparent substrate and the chromium based material film is deposited by sputtering by controlling the temperature of an object to be sputtered upon the sputtering to 100°C or less. Ž<P>COPYRIGHT: (C)2006,JPO&NCIPI Ž</p> |
