PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

摘要

PURPOSE: A plasma processing device and a processing method thereof are provided to easily perform a plasma process by controlling a magnetic field according to the kind of the plasma process. CONSTITUTION: A plasma processing device includes a chamber and a magnetic field forming unit. The chamber includes a substrate on the upper side. The magnetic field forming unit is arranged to surround the outside of the chamber and includes a plurality of magnetic segments(22) around the substrate. The magnetic field forming unit includes a distance control unit(28) which controls the separation distance between the chamber and the magnetic segments.