SUBSTRATE SUPPORT MEMBER AND APPARATUS FOR TREATING SUBSTRATE WITH THE SAME

摘要

PURPOSE: A substrate support unit and an apparatus for treating a substrate including the same are provided to clean particles on the edge and the lateral side of a substrate after an etching process for the edge of a substrate is performed. CONSTITUTION: A spin head(210) is composed of a vacuum chuck. The vacuum chuck absorbs a substrate. An edge cleaning unit(250) cleans the upper edge and the lower edge of the substrate which is arranged on the spin head. The edge cleaning unit includes a brush pin(260) and a driving unit(240). The brush pin contacts or non-contacts with the edge of the substrate. The driving unit transfers the brush pin to a location which contacts with the edge of the substrate.