发明名称 |
Exposure system and pattern formation method |
摘要 |
An exposure system includes a cleaning unit for cleaning a surface of a resist film formed on a wafer with a cleaning fluid and an exposure unit for performing pattern exposure with an immersion liquid provided between the resist film and a projection lens.
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申请公布号 |
US7713685(B2) |
申请公布日期 |
2010.05.11 |
申请号 |
US20050143666 |
申请日期 |
2005.06.03 |
申请人 |
PANASONIC CORPORATION |
发明人 |
ENDO MASAYUKI;SASAGO MASARU |
分类号 |
G03F7/26;G03F7/38;G03F7/039;G03F7/16;G03F7/20;H01L21/027 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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