发明名称 Field effect transistor having nitride semiconductor layer
摘要 A field effect transistor includes a nitride semiconductor layer; an InxAlyGa1-x-yN layer (wherein 0<x<1, 0<y<1 and 0<x+y<1) formed on the nitride semiconductor layer; and a source electrode and a drain electrode formed on and in contact with the InxAlyGa1-x-yN layer. The lower ends of the conduction bands of the nitride semiconductor layer and the InxAlyGa1-x-yN layer are substantially continuous on the interface therebetween.
申请公布号 US7714359(B2) 申请公布日期 2010.05.11
申请号 US20060355939 申请日期 2006.02.17
申请人 PANASONIC CORPORATION 发明人 NAKAZAWA SATOSHI;UEDA TETSUZO;TANAKA TSUYOSHI
分类号 H01L31/072;H01L31/0328;H01L31/0336;H01L31/109 主分类号 H01L31/072
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