发明名称 |
METHOD OF MANUFACTURING MULTI-BIT-PER CELL NON-VOLATILE MEMORY CELL AND NOR TYPE MEMORY ARCHITECTURE USING THEREOF |
摘要 |
<p>PURPOSE: A manufacturing method of a non-volatile memory cell and a NOR type memory architecture thereof are provided to improve whole memory integration degree by using a non-volatile memory. CONSTITUTION: A character-I like active fin forming a source/drain region on both sides is patterned(S110). An oxide film is deposited(S120). A first oxide film is formed in the active fin region(S130). A character-T like gate is patterned by using a hard mask pattern as the mask on a deposited polysilicon. A second oxide film is formed in the gate region(S150). A charge trapped layer is formed between the first oxide film and the second oxide film(S160).</p> |
申请公布号 |
KR100956798(B1) |
申请公布日期 |
2010.05.11 |
申请号 |
KR20090064187 |
申请日期 |
2009.07.14 |
申请人 |
KOOKMIN UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION |
发明人 |
KIM, DONG MYONG;KIM, DEA HWAN;LEE, SUN YEONG |
分类号 |
H01L21/8247;H01L27/115 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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