发明名称 METHOD OF MANUFACTURING MULTI-BIT-PER CELL NON-VOLATILE MEMORY CELL AND NOR TYPE MEMORY ARCHITECTURE USING THEREOF
摘要 <p>PURPOSE: A manufacturing method of a non-volatile memory cell and a NOR type memory architecture thereof are provided to improve whole memory integration degree by using a non-volatile memory. CONSTITUTION: A character-I like active fin forming a source/drain region on both sides is patterned(S110). An oxide film is deposited(S120). A first oxide film is formed in the active fin region(S130). A character-T like gate is patterned by using a hard mask pattern as the mask on a deposited polysilicon. A second oxide film is formed in the gate region(S150). A charge trapped layer is formed between the first oxide film and the second oxide film(S160).</p>
申请公布号 KR100956798(B1) 申请公布日期 2010.05.11
申请号 KR20090064187 申请日期 2009.07.14
申请人 KOOKMIN UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION 发明人 KIM, DONG MYONG;KIM, DEA HWAN;LEE, SUN YEONG
分类号 H01L21/8247;H01L27/115 主分类号 H01L21/8247
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