| 摘要 |
PURPOSE: An etching composition for metal layer is provided to easily enable etching monolayer of AZO or silver and bilayer or trilayer thereof at the same time without residue. CONSTITUTION: An etching composition for monolayer of AZO or silver and bilayer or trilayer thereof contains 0.5-15 weight% of hydrogen peroxide, 1-15 weight% of nitrate, 0.05-10 weight% of organic acid, inorganic acid or mixture thereof, 0.1-10 weight% of organic acid salt, and residual amount of water. The nitrate is selected from potassium nitrate, sodium nitrate, ammonium nitrate, aluminum nitrate and ferric nitrate. The organic acid salt is selected from formic acid, acetic acid, oxalic acid, and malonic acid.
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