发明名称 |
Apparatus including showerhead electrode and heater for plasma processing |
摘要 |
A plasma processing apparatus includes a heater in thermal contact with a showerhead electrode, and a temperature controlled top plate in thermal contact with the heater to maintain a desired temperature of the showerhead electrode during semiconductor substrate processing. A gas distribution member supplies a process gas and radio frequency (RF) power to the showerhead electrode.
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申请公布号 |
US7712434(B2) |
申请公布日期 |
2010.05.11 |
申请号 |
US20040835400 |
申请日期 |
2004.04.30 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
DHINDSA RAJINDER;LENZ ERIC |
分类号 |
C23C16/509;C23C16/06;C23C16/22;C23C16/505;C23F1/00;H01J37/32;H01L21/306 |
主分类号 |
C23C16/509 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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