| 发明名称 |
Mechanism for forming a remote delta doping layer of a quantum well structure |
| 摘要 |
A method of fabricating a quantum well device includes forming a diffusion barrier on sides of a delta layer of a quantum well to confine dopants to the quantum well.
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| 申请公布号 |
US7713803(B2) |
申请公布日期 |
2010.05.11 |
| 申请号 |
US20070731266 |
申请日期 |
2007.03.29 |
| 申请人 |
INTEL CORPORATION |
发明人 |
JIN BEEN-YIH;KAVALIEROS JACK T.;DATTA SUMAN;MAJUMDAR AMLAN;CHAU ROBERT S. |
| 分类号 |
H01L21/336 |
主分类号 |
H01L21/336 |
| 代理机构 |
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代理人 |
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| 地址 |
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