发明名称 Selective plating apparatus and selective plating method
摘要 A selective plating apparatus for applying selective electrolytic plating to a metal member includes: a mask member having a recess portion so that a space is formed to which predetermined parts of a surface of the metal member are exposed when the mask member is attached to the metal member, and having at least one supply opening for supplying electrolytic plating solution into the space and a discharge opening for discharging the electrolytic plating solution from the space both formed in a bottom portion of the recess portion; and at least one injection nozzle which injects the electrolytic plating solution in an oblique direction with respect to the predetermined parts of the surface of the metal member, and is arranged in vicinity of the supply opening.
申请公布号 US7713398(B2) 申请公布日期 2010.05.11
申请号 US20060419904 申请日期 2006.05.23
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 OGIHARA YOKO;TAKANO TAKESHI;NAKABAYASHI KAZUO
分类号 C25D5/08 主分类号 C25D5/08
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