| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.
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| 申请公布号 |
US7714305(B2) |
申请公布日期 |
2010.05.11 |
| 申请号 |
US20060371232 |
申请日期 |
2006.03.09 |
| 申请人 |
ASML HOLDING N.V.;ASML NETHERLANDS B.V. |
发明人 |
VISSER HUIBERT;CALLAN DAVID WILLIAM;MUNNIG SCHMIDT ROBERT-HAN;ROBBINS GEORGE HOWARD |
| 分类号 |
G21G1/00 |
主分类号 |
G21G1/00 |
| 代理机构 |
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