发明名称 SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, PROGRAM, RECORDING MEDIUM AND SUBSTITUTING AGENT
摘要 Provided is a substrate processing method wherein a plurality of kinds of liquids are used. In the method, the liquid left on the substrate after processing by using the liquid is speedily and surely substituted with the liquid to be subsequently used. The method is provided with a step of processing a substrate (W) with the processing liquid, and a step of supplying a substituting liquid on the substrate and substituting the processing liquid left on the substrate with the substituting liquid. The substituting liquid to be used in the substituting step has a surface tension smaller than that of the processing liquid and has the same density as that of the processing liuqid.
申请公布号 KR20100049046(A) 申请公布日期 2010.05.11
申请号 KR20107002022 申请日期 2008.07.24
申请人 TOKYO ELECTRON LIMITED 发明人 HIROSHIRO KOUKICHI;TOSHIMA TAKAYUKI
分类号 B08B3/04;G02F1/133;H01L21/304 主分类号 B08B3/04
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