| 发明名称 |
SUBSTRATE SUPPORT UNIT, AND APPARATUS AND METHOD FOR TREATING SUBSTRATE USING THE SAME |
| 摘要 |
<p>PURPOSE: A substrate support unit, an apparatus and a method for processing a substrate using the same are provided to prevent the congestion of gas which floats a substrate by discharging the gas to the outside of a support plate. CONSTITUTION: A gas injection unit injects gas on the lower edge of a substrate(W) which is loaded on a support plate(110). A gas flow guide unit guides the gas from the gas injection unit to the outside of the support plate. The gas flow guide unit includes a groove(113a) which connects the upper edge of the support plate and the lateral side(113) of the support plate. The groove is formed to the rotational direction of the support plate.</p> |
| 申请公布号 |
KR20100048401(A) |
申请公布日期 |
2010.05.11 |
| 申请号 |
KR20080107531 |
申请日期 |
2008.10.31 |
| 申请人 |
SEMES CO., LTD. |
发明人 |
NOH, HWAN IK;SONG, GIL HUN |
| 分类号 |
H01L21/683;H01L21/027 |
主分类号 |
H01L21/683 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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