发明名称 UV CURABLE RESIN COMPOSITION AND PROCESS FOR PRODUCING A SUBSTRATE HAVING A PATTERN USING THE SAME
摘要 PURPOSE: An UV-curable resin composition is provided to use for forming micropattern to a flexible material and prism sheet. CONSTITUTION: An UV-curable resin composition contains: 10-50 weight% of bifunctional urethane(meth)acrylate which is synthesized with polycarbonate polyol having 1000 molecular weight; 0.1-50 weight% of bifunctional urethane (meth)acrylate which is synthesized with polycarbonate polyol of 2000 molecular weight; 5-60 weight% of UV-reactive monomer, and 1-10 weight% of photopolymerization initiator.
申请公布号 KR20100048512(A) 申请公布日期 2010.05.11
申请号 KR20080107705 申请日期 2008.10.31
申请人 SSCP CO., LTD. 发明人 JUNG, TAE YUN;YU, JEONG JUN;OH, JUNG HYUN
分类号 C08F290/06;C08F290/02 主分类号 C08F290/06
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