发明名称 |
Equipment and method for monitoring an immersion lithography device |
摘要 |
The invention concerns an equipment for monitoring an immersion lithography device provided with a main light source and a projection optics for printing images on a wafer. The propagating medium extending from the projection optics to the wafer consists of a liquid (3). The equipment comprises: a chamber (51) for receiving at least part of said liquid (3), a diffraction grating (50) immersed in the chamber; a secondary light source (271) for emitting a secondary incident beam (20) towards the grating so as to obtain a diffracted beam; angle measuring members (57) capable of measuring at least one diffraction angle corresponding to a maximum intensity of an order of diffraction of the beam diffracted by the grating (500), and computing means (505) for calculating an estimate of a physical quantity concerning the refractive index of the liquid.
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申请公布号 |
US7714992(B2) |
申请公布日期 |
2010.05.11 |
申请号 |
US20060991613 |
申请日期 |
2006.09.11 |
申请人 |
SOCIETE DE PRODUCTION ET DE RECHERCHES APPLIQUEES(S.O.P.R.A.) |
发明人 |
PIEL JEAN-PHILIPPE;STEHLE JEAN-LOUIS |
分类号 |
G01N21/41 |
主分类号 |
G01N21/41 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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