发明名称 Semiconductor device and method of forming a semiconductor device
摘要 A high voltage/power semiconductor device has a semiconductor layer having a high voltage terminal end and a low voltage terminal end. A drift region extends between the high and low voltage terminal ends. A dielectric layer is provided above the drift region. An electrical conductor extends across at least a part of the dielectric layer above the drift region, the electrical conductor being connected or connectable to the high voltage terminal end. The drift region has plural trenches positioned below the electrical conductor. The trenches extend laterally across at least a part of the drift region in the direction transverse the direction between the high and low voltage terminal ends of the semiconductor layer, each trench containing a dielectric material. The trenches improve the distribution of electric field in the device in the presence of the electrical conductor.
申请公布号 US7714407(B2) 申请公布日期 2010.05.11
申请号 US20070847201 申请日期 2007.08.29
申请人 CAMBRIDGE SEMICONDUCTOR LIMITED 发明人 UDREA FLORIN;LEE CERDIN
分类号 H01L29/00;H01L21/8238 主分类号 H01L29/00
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