| 发明名称 |
Method for fabricating thin film pattern, method for fabricating device, electro-optical apparatus, and electronic apparatus |
| 摘要 |
A method for fabricating a thin film pattern on a substrate includes a bank forming step of forming banks in a predetermined pattern on said substrate, a first material disposing step of disposing first liquid droplets made of a function liquid between said banks to form a first pattern, a second material disposing step of disposing second liquid droplets made of a function liquid on said first pattern, and an intermediate drying step of removing at least a part of a solvent contained in said first liquid droplets between said first material disposing step and said second material disposing step.
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| 申请公布号 |
US7713578(B2) |
申请公布日期 |
2010.05.11 |
| 申请号 |
US20040849235 |
申请日期 |
2004.05.20 |
| 申请人 |
SEIKO EPSON CORPORATION |
发明人 |
HIRAI TOSHIMITSU |
| 分类号 |
G02F1/1343;G03F9/00;G02F1/1345;G02F1/1362;G02F1/1368;G09F9/00;G09F9/30;H01L21/208;H01L21/28;H01L21/288;H01L21/3205;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L27/32;H01L29/786;H01L51/00;H01L51/40;H01L51/50;H01L51/56;H05B33/10;H05B33/12;H05K3/12 |
主分类号 |
G02F1/1343 |
| 代理机构 |
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