SUBSTRATE TREATMENT APPARATUS

摘要

PURPOSE: A substrate processing apparatus is provided to prevent a substrate from being contaminated by suppressing foreign materials like particles or process solution in a space between a gas discharge nozzle and the substrate. CONSTITUTION: A substrate holding unit holds a substrate(W). A gas discharge nozzle is positioned near the center part of the substrate held in the substrate holding unit. The gas discharge nozzle radially discharges the gas along the substrate from the gas discharge hole and forms the flow of the gas to cover the substrate. A gas supply unit supplies the gas to the gas discharge nozzle.