| 摘要 |
PURPOSE: A reaction pipe and a heat processing apparatus for a semiconductor process are provided to perform a thermal treatment with a high uniformity. CONSTITUTION: A reaction pipe and a heat processing apparatus for a semiconductor process are composed of a reaction tube(3), a heater(22), a substrate holder, a gas supply system, and a gas exhaust system. The reaction tube performs a thermal treatment by receiving while receiving a plurality of targets at a certain interval, and a heater surrounds the reaction tube. A substrate holder maintains the target in the reaction tube, and the gas supply system supplies a process gas into the reaction tube.
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