| 摘要 |
The invention is directed to an arrangement for generating extreme ultraviolet radiation from a plasma generated by an energy beam with high conversion efficiency, particularly for application in radiation sources for EUV lithography. It is the object of the invention to find a novel possibility for generating EUV radiation by means of a plasma induced by an energy beam that permits a more efficient conversion of the energy radiation into EUV radiation in the wavelength region of 13.5 nm and ensures a long lifetime of the optical components and the injection device. According to the invention, this object is met by using a mixture of particles with a carrier gas and the target feed device has a gas liquefaction chamber, wherein the target material is supplied to the injection unit as a mixture of solid particles in liquefied carrier gas, and a droplet generator is provided for generating a defined droplet size and series of droplets, wherein means which are controllable in a frequency-dependent manner and which are triggered by the pulse frequency of the energy beam are connected to the injection unit for the series of droplets.
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