发明名称 Method for holding semiconductor wafer
摘要 Provided is a method comprising: back grinding a back side or a semiconductor wafer W having a protective tape applied on the surface thereof leaving annularly an outer peripheral part un-ground; separating the protective tape from a surface of the semiconductor wafer W having an annular projected part formed in the outer peripheral part of the back side; applying a holding tape over the surface of the semiconductor wafer W from which the protective tape having been separated and a surface of a ring frame f; removing and separating the outer peripheral part in the semiconductor wafer applied and held on the holding tape, by annularly cutting; applying a dicing tape over the back side of the semiconductor wafer having been made flat and the back side of the ring frame; and separating the holding tape from the ring frame and the semiconductor wafer.
申请公布号 US7598120(B2) 申请公布日期 2009.10.06
申请号 US20080114544 申请日期 2008.05.02
申请人 NITTO DENKO CORPORATION 发明人 YAMAMOTO MASAYUKI;MORIMOTO KAZUO
分类号 H01L21/44;H01L21/48;H01L21/50 主分类号 H01L21/44
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