| 摘要 |
Described is an interferometric surface contour measurement system for projecting structured light patterns onto an object. The measurement system includes an interferometric projector, an imager, and a processor. The imager is rigidly coupled to the projector to maintain a stable relationship to the projected, structured light pattern. The imager receives the structured light pattern and together with the processor, determines whether the projected image includes a positional error. In some embodiments, the projector is a multi-channel projector, each channel having an optical axis spatially separated from the others, one of the channels including the imager and dedicated for determining positional error. In other embodiments, the projector is a single-channel projector projecting a structured light pattern onto the object, a portion of the structured light pattern being tapped-off for determining positional error.
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