发明名称 |
Polymer, resist composition and patterning process |
摘要 |
A (meth)acrylic copolymer is endowed with a good profile of rigidity and hydrophilicity by introducing not only polycyclic structure units, but also recurring units having a high polarity. A chemically amplified positive resist composition comprising the polymer has a high sensitivity, resolution and etch resistance and improved substrate adhesion and developer affinity.
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申请公布号 |
US7598015(B2) |
申请公布日期 |
2009.10.06 |
申请号 |
US20050155605 |
申请日期 |
2005.06.20 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
TACHIBANA SEIICHIRO;WATANABE TAKERU;NISHI TSUNEHIRO |
分类号 |
G03F7/039;C08F220/26;G03C1/492;G03C1/73;G03F7/20;G03F7/30;G03F7/38 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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