发明名称 |
Integrated thin film explosive micro-detonator |
摘要 |
A method of making a thin film explosive detonator includes forming a substrate layer; depositing a metal layer in situ on the substrate layer; and reacting the metal layer to form a primary explosive layer. The method and apparatus formed thereby integrates fabrication of a micro-detonator in a monolithic MEMS structure using "in-situ" production of the explosive material within the apparatus, in sizes with linear dimensions below about 1 mm. The method is applicable to high-volume low-cost manufacturing of MEMS safety-and-arming devices. The apparatus can be initiated either electrically or mechanically at either a single point or multiple points, using energies of less than about 1 mJ.
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申请公布号 |
US7597046(B1) |
申请公布日期 |
2009.10.06 |
申请号 |
US20030729266 |
申请日期 |
2003.12.03 |
申请人 |
THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY |
发明人 |
LAIB GERALD |
分类号 |
F42B3/10;C06C5/06;C06C9/00;F42C19/08 |
主分类号 |
F42B3/10 |
代理机构 |
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