| 摘要 |
PURPOSE: A silica-based positive type photosensitive organic compound is provided to obtain a silica-based film with excellent photosensitive property, insulation property, low-dielectric property, heat resistance, thickening, and transparency. CONSTITUTION: A silica-based positive type photosensitive organic compound includes at least one of an alkali soluble siloxane resin, a dissolution inhibitor, an acid generator, and a solvent. The alkali soluble siloxane resin is obtained by hydrolysis-condensation and comprises a compound represented by formula (1), wherein R1 and A are an organic group and X is a hydrolysable group. The dissolution inhibitor has a functional group capable of being degraded by action of an acid. |
