| 摘要 |
<p>PURPOSE: A method and an apparatus for inspecting the defect of a film are provided to use in inspecting defects of a base film for manufacturing an optical film by detecting minute detects with high precision. CONSTITUTION: A method and an apparatus for inspecting the defect of a film comprise followings. The reflective diffusion light reflected from the film surface is detected by a light receiving unit(24). The minute defects of the film surface are inspected based on the detection result. The film is extended in the horizontal direction and the vertical direction and the parallelization of the film is maintained and inspection light is irradiated on the surface of the film. The light receiving unit is arranged to be parallel to the direction in which minute defects(14) are generated and receives reflective diffusion light.</p> |
