| 摘要 |
PURPOSE: A plasma processing apparatus, a plasma processing method and a computer readable medium are provided to make the variation of plasma and impedance of ion shift and low reflection to high frequency power small even when the high frequency power is changed periodically. CONSTITUTION: A plasma process apparatus includes a processing container(10), a first electrode, a processing gas supply part(65), a plasma excitation part, a first radio frequency feeding unit, a first radio frequency power modulator, and a first frequency modulator. The processing container is cable of being vacuum-exhausted, and the first electrode supports a target substrate(W) within the processing container. A processing gas supply part supplies a process gas to a process space on the first electrode in the processing container. The plasma excitation part generates plasma by exciting the process gas within the processing container.
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