Well structures for fabricating organic semiconductor devices

摘要

A stepped double bank well structure is formed using first and second insulating layers 800 , 804 which is used for receiving inkjet deposited organic semiconducting material for the manufacture of OTFTs and OLEDs. The first and second bank layers may be photoresist structures which are developed differently or they may comprise insulating materials having different etch removal rates in a single etching step. The upper and lower bank layers may have differing wettability to facilitate the inkjet deposition of organic semiconductors. The stepped double bank well structures may have a positive or negative edge profile to provide overhanging or stepped well configurations.