发明名称 |
HYDROXYL-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS |
摘要 |
<p>PURPOSE: A hydroxyl group-containing monomer is provided to ensure excellent transparency for radiation with wavelength 300 nm or less and acid diffusion control effect. CONSTITUTION: A hydroxyl group-containing monomer is represented by chemical formula 1. In chemical formula 1, R1 represents hydrogen atom, fluorine atom, methyl group or trifluoromethyl group; R2 and R3 represent independently C1-15 linear, branched or cyclic monovalant hydrocarbon group, wherein the R2 and R3 can be bonded with each other and form a aliphatic hydrocarbon ring with a carbon atom.</p> |
申请公布号 |
KR20090100276(A) |
申请公布日期 |
2009.09.23 |
申请号 |
KR20090022558 |
申请日期 |
2009.03.17 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
KINSHO TAKESHI;OHASHI MASAKI;HASEGAWA KOJI;WATANABE TAKERU |
分类号 |
C07C59/42;C08F20/26;G03F7/004;H01L21/027 |
主分类号 |
C07C59/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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