发明名称 HYDROXYL-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
摘要 <p>PURPOSE: A hydroxyl group-containing monomer is provided to ensure excellent transparency for radiation with wavelength 300 nm or less and acid diffusion control effect. CONSTITUTION: A hydroxyl group-containing monomer is represented by chemical formula 1. In chemical formula 1, R1 represents hydrogen atom, fluorine atom, methyl group or trifluoromethyl group; R2 and R3 represent independently C1-15 linear, branched or cyclic monovalant hydrocarbon group, wherein the R2 and R3 can be bonded with each other and form a aliphatic hydrocarbon ring with a carbon atom.</p>
申请公布号 KR20090100276(A) 申请公布日期 2009.09.23
申请号 KR20090022558 申请日期 2009.03.17
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 KINSHO TAKESHI;OHASHI MASAKI;HASEGAWA KOJI;WATANABE TAKERU
分类号 C07C59/42;C08F20/26;G03F7/004;H01L21/027 主分类号 C07C59/42
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