Hydroxyl-containing monomer, polymer, resist composition, and patterning process

摘要

A hydroxyl-containing monomer of formula (1) is provided wherein R 1 is H, F, methyl or trifluoromethyl, R 2 and R 3 are monovalent C 1 -C 15 hydrocarbon groups, or R 2 and R 3 may form an aliphatic ring. The monomers are useful for the synthesis of polymers which have high transparency to radiation of up to 500 nm and the effect of controlling acid diffusion so that the polymers may be used as a base resin to formulate radiation-sensitive resist compositions having a high resolution.