| 发明名称 |
Tantalum compound, method for producing same, tantalum-containing thin film and method for forming same |
| 摘要 |
A novel tantalum compound, a method for producing the novel tantalum compound, and a method for stably forming a tantalum-containing thin film which contains the desired element. The tantalum compound enables one to selectively form a tantalum-containing thin film free of halogen and the like, and various tantalum-containing thin films which contain the desired element.
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| 申请公布号 |
US7592471(B2) |
申请公布日期 |
2009.09.22 |
| 申请号 |
US20060815386 |
申请日期 |
2006.01.25 |
| 申请人 |
TOSOH CORPORATION;SAGAMI CHEMICAL RESEARCH CENTER |
发明人 |
SEKIMOTO KENICHI;TADA KEN-ICHI;TAKAMORI MAYUMI;YAMAKAWA TETSU;FURUKAWA TAISHI;OSHIMA NORIAKI |
| 分类号 |
C07F17/00;C23C16/00;H01L21/4763 |
主分类号 |
C07F17/00 |
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