| 摘要 |
A cleaning method of a substrate processing system, a storage medium, and the substrate processing system are provided to clean a receiving chamber under a proper condition by performing a predetermined kind of processes for a cleaning process. A predetermined processing is consecutively performed on a substrate with a plurality of lots. A process number corresponding to the timing for performing the cleaning process is previously set(S701). A kind of the process about each lot and the kind of the cleaning process are previously set(S702). At the consecutive two lots, whether the kind of the process for a prior lot is identical the kind of the posterior lot is determined(S706). The number of the predetermined processes is summed up(S705). The predetermined kind of the process is performed at the lot including the substrate in which the predetermined process is performed(S707).
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