| 摘要 |
A substrate processing apparatus is provided to suppress a product cost of a heater by simplifying a structure in comparison with the substrate processing apparatus using a gas pipe. A process chamber(11) performs the processing using a plurality of gases on a substrate to be processed. A gas inputting unit(12) is prepared in the process chamber and inputs the plurality of gases to the process chamber. A plurality of gas flow channels are arranged in the process chamber and induce the plurality of gases from the gas supply unit to the gas inputting unit. An entrance block(13) includes a heater(23) heating the gas. The gas flow channel is prepared in a height direction of the entrance block with the multilayer. A loading side loading the entrance block of the process chamber is flat.
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