发明名称 |
Apparatus and method for use of optical system with a plasma processing system |
摘要 |
A plasma processing system and method for operating an optical system in conjunction with a plasma processing system are provided. The plasma processing system includes an optical system in communication with a plasma processing chamber of the plasma processing system. The optical system has a window and is constructed and arranged to detect a plasma process condition through the window and a transmission condition of the window. The method includes detecting an optical emission from the plasma processing region and monitoring contamination of a window provided by the optical system.
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申请公布号 |
US7591923(B2) |
申请公布日期 |
2009.09.22 |
申请号 |
US20050082223 |
申请日期 |
2005.03.17 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
MITROVIC ANDREJ S;LUDVIKSSON AUDUNN |
分类号 |
G01L21/30;H01J37/32;H05H1/00 |
主分类号 |
G01L21/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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