发明名称 Apparatus and method for use of optical system with a plasma processing system
摘要 A plasma processing system and method for operating an optical system in conjunction with a plasma processing system are provided. The plasma processing system includes an optical system in communication with a plasma processing chamber of the plasma processing system. The optical system has a window and is constructed and arranged to detect a plasma process condition through the window and a transmission condition of the window. The method includes detecting an optical emission from the plasma processing region and monitoring contamination of a window provided by the optical system.
申请公布号 US7591923(B2) 申请公布日期 2009.09.22
申请号 US20050082223 申请日期 2005.03.17
申请人 TOKYO ELECTRON LIMITED 发明人 MITROVIC ANDREJ S;LUDVIKSSON AUDUNN
分类号 G01L21/30;H01J37/32;H05H1/00 主分类号 G01L21/30
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