发明名称 Lithographic apparatus and device manufacturing method
摘要 A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
申请公布号 US7593092(B2) 申请公布日期 2009.09.22
申请号 US20060448990 申请日期 2006.06.08
申请人 ASML NETHERLANDS B.V. 发明人 LOF JOERI;BIJLAART ERIK THEODORUS MARIA;BUTLER HANS;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;KOLESNYCHENKO ALEKSEY;LOOPSTRA ERIK ROELOF;MEIJER HENDRICUS JOHANNES MARIA;MERTENS JEROEN JOHANNES SOPHIA MARIA;MULKENS JOHANNES CATHARINUS HUBERTUS;RITSEMA ROELOF AEILKO SIEBRAND;VAN SCHAIK FRANK;SENGERS TIMOTHEUS FRANCISCUS;SIMON KLAUS;DE SMIT JOANNES THEODOOR;STRAAIJER ALEXANDER;STREEFKERK BOB;VAN SANTEN HELMAR
分类号 G03B27/52;G03B27/42;G03F7/20;H01L21/027 主分类号 G03B27/52
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