发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
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申请公布号 |
US7593092(B2) |
申请公布日期 |
2009.09.22 |
申请号 |
US20060448990 |
申请日期 |
2006.06.08 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LOF JOERI;BIJLAART ERIK THEODORUS MARIA;BUTLER HANS;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;KOLESNYCHENKO ALEKSEY;LOOPSTRA ERIK ROELOF;MEIJER HENDRICUS JOHANNES MARIA;MERTENS JEROEN JOHANNES SOPHIA MARIA;MULKENS JOHANNES CATHARINUS HUBERTUS;RITSEMA ROELOF AEILKO SIEBRAND;VAN SCHAIK FRANK;SENGERS TIMOTHEUS FRANCISCUS;SIMON KLAUS;DE SMIT JOANNES THEODOOR;STRAAIJER ALEXANDER;STREEFKERK BOB;VAN SANTEN HELMAR |
分类号 |
G03B27/52;G03B27/42;G03F7/20;H01L21/027 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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地址 |
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