发明名称 Solid-state imaging device and method of manufacturing the same
摘要 There are provided a semiconductor substrate 101 on which solid-state imaging devices are formed, and a translucent member 201 provided onto a surface of the semiconductor substrate such that spaces are provided to oppose to light receiving areas of the solid-state imaging devices, wherein external connecting terminals are arranged on an opposing surface of the semiconductor substrate 101 to a solid-state imaging device forming surface, and the external connecting terminals are connected to the solid-state imaging devices via through-holes provided in the semiconductor substrate 101.
申请公布号 US7592200(B2) 申请公布日期 2009.09.22
申请号 US20050165133 申请日期 2005.06.24
申请人 FUJIFILM CORPORATION 发明人 MAEDA HIROSHI;NISHIDA KAZUHIRO;NEGISHI YOSHIHISA;HOSAKA SHUNICHI
分类号 H01L21/00;H01L27/14;H01L23/04;H01L23/12;H01L27/146;H01L29/04;H01L29/20;H01L31/02;H01L31/0203;H01L31/036;H01L31/0376;H01L31/20;H04N5/225;H04N5/335 主分类号 H01L21/00
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