发明名称 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
摘要 The measurement of two separately polarized beams (Ix, Iy) upon diffraction from a substrate (W) in order to determine properties of the substrate is disclosed. Circularly or elliptically polarized radiation is passed via a variable phase retarder in order to change the phase of one of two orthogonally polarized radiation beams with respect to the other of the two beams. The phase change is dependent on the wavelength of the polarized beam. The relative phases of the two radiation beams and other features of the beams as measured in a detector gives rise to properties of the substrate surface.
申请公布号 NL1036684(A1) 申请公布日期 2009.09.22
申请号 NL20091036684 申请日期 2009.03.10
申请人 ASML NETHERLANDS B.V. 发明人 ALEXANDER STRAAIJER
分类号 G03F7/20;G01N21/47 主分类号 G03F7/20
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