发明名称 Photoresist compositions comprising resin blends
摘要 New positive photoresist compositions are provided that contain a photoactive component and blend of at least two distinct resins: i) a first resin that comprises carbocyclic aryl units with hetero substitution (particularly hydroxy or thio) and ii) a second cross-linked resin. Preferred photoresists of the invention can be imaged at short wavelengths, such as sub-200 nm, particularly 193 nm.
申请公布号 US7592125(B2) 申请公布日期 2009.09.22
申请号 US20060334939 申请日期 2006.01.19
申请人 ROHM AND HAAS ELECTRIC MATERIALS LLC 发明人 SUZUKI YASUHIRO;XU CHENG-BAI
分类号 G03F7/004;G03F7/30 主分类号 G03F7/004
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