发明名称 Method for manufacturing patterned layer on substrate
摘要 A method for manufacturing a patterned layer (106) on a substrate (100) includes the following steps: providing a substrate having a plurality of banks (102) formed thereon, the substrate and the banks cooperatively defining a plurality of accommodating spaces (104), wherein each of the accommodating spaces has a first edge (110) and a second edge (112) parallel to the first edge, a distance between the first edge and the second edge is b; the first nozzle (302) moving along a first path (306), and the first path is parallel to the first edge, a distance between the first path and the first edge is a; the first nozzle jetting ink into the accommodating space; the second nozzle (304) moving along a second path (310), a distance between the first path and the second path is c, and the distance c satisfies one of the two equations: 0<c<b-a, and 0<c<a.
申请公布号 US7592044(B2) 申请公布日期 2009.09.22
申请号 US20070964543 申请日期 2007.12.26
申请人 ICF TECHNOLOGY LIMITED 发明人 CHOU CHING-YU;WANG YU-NING;HUANG JIH-JENN;LIAO YI-MING
分类号 B05D5/00 主分类号 B05D5/00
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