| 摘要 |
A chamber for processing multiple targets includes a plurality of rotatable holders, mounted on a rotatable disk, wherein only one holder is in a diametrical direction, specifically a direction that is the same or vertically parallel to the ion beam pathway. An ion implantation process includes propagating an ion beam along an ion beam pathway, rotating a disk having a plurality of holders to bring a target supported by a holder in the ion beam pathway; and rotating the holder to expose different surfaces of the target to the ion beam. In the process, not more than one holder is on a diametrical direction. A method for moving a target during an ion implantation also is disclosed. The invention is particularly useful in doping titanium- based medical devices with carbon ions. |
