发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTO SPACER AND METHOD OF MANUFACTURING THE SAME, AND SUBSTRATE FOR DISPLAY AND DISPLAY
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition forming a cured substance superior in elastic recovery rate, a photo spacer superior in elastic recovery rate and method of manufacturing the same, and a substrate for a display suppressing display unevenness and the display using the same. <P>SOLUTION: In the photosensitive resin composition including at least a photo photopolymerizable monomer, a binder, and a photopolymerization initiator, 50 mass% or more of the photopolymerizable monomer is urethane acrylate in which the number of double bond groups is 0.2&times;10<SP>-3</SP>mol/g or more and less than 4.5&times;10<SP>-3</SP>mol/g. The photo spacer formed by using the photosensitive resin composition and the method of manufacturing the same, and the substrate for the display including the photo spacer and the display are also provided. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009199019(A) 申请公布日期 2009.09.03
申请号 JP20080043405 申请日期 2008.02.25
申请人 FUJIFILM CORP 发明人 MIYAKE KAZUHITO
分类号 G03F7/038;G02F1/1339;G03F7/027 主分类号 G03F7/038
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