| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device in which an intrusion of atmosphere into a plasma treatment portion can be prevented and a stable plasma can be generated and a treatment gas consumption can be reduced, and an outflow of the treatment gas and gas generated by the treatment can be prevented. <P>SOLUTION: The plasma treatment device is provided with a case having an entrance port of a treating base material and an exit port and an exhausting port, a plasma treatment portion which is arranged in the case and generates plasma and treats the treating base material, an entrance passage to connect the entrance port with the plasma treatment portion, an exit passage to connect the plasma treatment portion and the exit port, a conveyor portion to convey the treating base material through the entrance passage and the exit passage, a first ventilating plate exposed to the entrance passage to cover from entrance port through the plasma treatment portion, a second ventilating plate exposed to the exit passage to cover from the plasma treatment portion through the exit port, and a suction and exhaust portion which sucks gas in the entrance passage and the exit passage through the first and the second ventilating plates and exhausts through the exhausting port. The first and the second ventilating plates are provided each with a plurality of ventilating ports. <P>COPYRIGHT: (C)2009,JPO&INPIT |
