发明名称 Laser Annealing Apparatus and Method
摘要 The irradiation unevenness caused by drift occurring in a beam short-axis direction is reduced without adding a new beam shaping unit and affecting the propagation characteristic of a beam in an optical resonator. A position deviation detector for detecting a position deviation of a laser beam before passing through a beam shaping optical system, an angle deviation detector for detecting an angle deviation of the laser beam before passing through the beam shaping optical system, a deflection mirror for deflecting the laser beam, which is disposed in an optical path between a laser and an object (substrate), and a mirror controller for controlling orientation of the deflection mirror, based on detection data obtained using the position deviation detector and the angle deviation detector so as to eliminate the position deviation from a reference irradiation position in the short-axis direction of a linear beam on a surface to be irradiated.
申请公布号 US2009218475(A1) 申请公布日期 2009.09.03
申请号 US20090355871 申请日期 2009.01.19
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 KAWAKAMI RYUSUKE;KAWAGUCHI NORIHITO
分类号 G01J1/20;A61N5/00 主分类号 G01J1/20
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