| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which is small, and a substrate processing method which can process a substrate front surface promptly and satisfactorily. SOLUTION: A dry nitrogen gas is simultaneously supplied to a processing space 162 by two lines, that is (1) a line supplying the dry nitrogen gas from a front surface perimeter portion of a substrate W, and (2) a line supplying the dry nitrogen gas from a front surface center portion of the substrate W, and consequently a humidity of the processing space 162 can be uniformly reduced. Moreover, while supplying the dry nitrogen gas to the processing space 162, since a gas discharge of the processing space 162 is suppressed rather than a gas discharge at the time of a wet processing, a humidity of the processing space 162 can be promptly reduced. Since a drying processing is thus carried out in the state where the humidity of the processing space 162 is reduced, the substrate can be dried, while suppressing an occurrence of a watermark or the like on the substrate front surface. COPYRIGHT: (C)2009,JPO&INPIT
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