| 摘要 |
PROBLEM TO BE SOLVED: To form a film having negative fixed charges on a detection surface of a sensor portion without performing ion implantation nor annealing. SOLUTION: In a state wherein although an oxygen supply film capable of supplying oxygen is present on the detection surface of the sensor portion 131 where it is desired that an oxide insulating film to become a negative charge accumulation layer 182 later is left, an oxygen non-supply film which contains no oxygen is present in an area, other the detection surface, where it is not desired that the oxide insulating film is present, a metal film 182a is formed over the entire surface thereof (1). A heat treatment is carried out to crystallize a metal film 182a while forming a metal oxide film through reaction on the oxygen supply film on the sensor portion 131 at the border of the metal film 182a to form negative fixed charges in the metal film 182a, and the metal film 182a on a peripheral circuit does not react on the oxygen non-supply film, so that the metal film 182a is left (2). Etching is carried out to remove the metal film 182a in an area including the peripheral circuit other than the sensor portion 131, but the metal oxide film is left on the sensor portion 131 (3). COPYRIGHT: (C)2009,JPO&INPIT
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