发明名称 |
PROCESSING APPARATUS, WASHING METHOD, AND STORAGE MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To prevent particles from adhering to a substrate by shortening the time required for the washing process of a rectangular recessed portion into which the substrate is to be inserted in the substrate holding part. SOLUTION: A coating unit is provided with a rectangular recessed portion 3 into which a rectangular substrate G is to be inserted, and a spin chuck S disposed freely rotatably about a vertical axis wherein a washing liquid is supplied along sides of the recessed portion to the rotating spin chuck S from a washing liquid nozzle 61 when the spin chuck S is washed, and then a gas for drying to enhance drying of the washing liquid is supplied along the sides of the recessed portion from a gas nozzle to the spin chuck S after the washing liquid is supplied. COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009195835(A) |
申请公布日期 |
2009.09.03 |
申请号 |
JP20080040789 |
申请日期 |
2008.02.22 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
HIROTA FUMIO;HAMADA MASAHITO;KOHAMA NORIFUMI |
分类号 |
B08B3/02;B05C11/10;H01L21/027 |
主分类号 |
B08B3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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