发明名称 SEMICONDUCTOR SUBSTRATE CONTACT VIA
摘要 <p>Edges of a first conductive layer (104) and a silicate glass layer (106) extend adjacent one another along a via (164) extending to a semiconductor substrate (41). An electrical conductor (112/114) extends through the via (164) into contact with the semiconductor substrate (41).</p>
申请公布号 WO2009108201(A1) 申请公布日期 2009.09.03
申请号 WO2008US55395 申请日期 2008.02.28
申请人 HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.;BURTON, GREGORY, N.;MIKULAN, PAUL, I. 发明人 BURTON, GREGORY, N.;MIKULAN, PAUL, I.
分类号 H01L21/28 主分类号 H01L21/28
代理机构 代理人
主权项
地址