发明名称 POLYHYDRIC COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME
摘要 The present invention provides a polyhydric compound represented by the formula (I): wherein R51 to R67 each independently represent a hydrogen atom etc., at least one selected from the group consisting of R1 to R5 is a group represented by the formula (II): wherein Q1 and Q2 each independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., and A+ represents an organic counter ion, and the others are hydrogen atoms or groups represented by the formula (III): wherein X1 to X4 each independently represent a hydrogen atom etc., n represents an integer of 0 to 3, W represents any one of the following groups: Z1 represents a C1-C6 alkyl group etc., and ring Y represents a C3-C20 alicyclic hydrocarbon group, and a chemically amplified resist composition containing the same.
申请公布号 US2009220886(A1) 申请公布日期 2009.09.03
申请号 US20090391165 申请日期 2009.02.23
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 TAKEMOTO ICHIKI;ANDO NOBUO
分类号 G03F7/004;C07C69/616;C07C309/24;C07D333/46 主分类号 G03F7/004
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