发明名称 SUBSTRATE INSPECTION APPARATUS
摘要 PROBLEM TO BE SOLVED: To generate inspection result data capable of facilitating the grasp of the transition of measurement values on substrates to be inspected. SOLUTION: A substrate inspection apparatus includes a measuring part for measuring a resistance value R (an electrical parameter) of a pattern to be inspected and generating measurement data; a storage part for storing reference data for inspection; and a processing part for determining the quality of the pattern to be inspected on the basis of the measurement data and the reference data for inspection and generating inspection result data. The storage part stores each range data, as the reference data for inspection, of determination ranges A12L-A12U (two or more first determination ranges) into which a normalcy determination range A1 is divided; a failure determination range A2 (a first failure determination range) above an upper limit of the range A1; and a failure determination range A3 (a second failure determination range) below a lower limit of the range A1. The processing part generates data capable of specifying any first determination range as the inspection result data when it is determined that measurement data is included in any first determination range and that the pattern to be inspected is normal. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009198186(A) 申请公布日期 2009.09.03
申请号 JP20080036931 申请日期 2008.02.19
申请人 HIOKI EE CORP 发明人 TANAKA YUJI
分类号 G01R31/02;H05K3/00 主分类号 G01R31/02
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